Principal Investigator:
Ir Prof. CHEUNG Chi-fai Benny, Chair Professor of Ultra-precision Machining and Metrology, Department of Industrial and Systems Engineering and Director of State Key Laboratory of Ultra-precision Machining Technology
Optical characterisation is essential for determining whether an optical system or element meets specific performance requirements. This process has wide applications in various industrial fields. However, many existing optical characterisation instruments can only measure individual optical parameters for specific industrial fields.
This invention introduces a novel multi-mode optical characterisation interferometer (MOCI). Based on wavefront and shear interferometry measurement principles, the MOCI uses light wavefronts to determine the optical properties of materials. These properties affect the functional performance of an optical system or element.
The MOCI offers versatile measurement capabilities, allowing it to evaluate multiple optical properties in a single instrument. It can be used across different applications, including power maps, cylindrical distribution, and astigmatism axis for optometry products including myopia defocus spectacle lenses. Additionally, it assesses phase distributions, reflective index and modulation transfer function for metastructures, and evaluates the surface roughness and flatness of wafers for semiconductor applications.
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