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Call for applications: Innovation and Technology Scholarship 2020
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This scheme offers you an opportunity to strengthen your global outlook, learn from professionals and renowned experts and gain exposure in relevant industries. 40 outstanding PolyU students were awarded the Scholarship in the past 9 years

PolyU is invited to nominate up to 13 candidates to compete for 25 Scholarships each with a maximum value of HK$150,000.  Please click here for the Information Sheet for the details on the Scheme components, eligibility and award conditions. If you would like to pursue science and technology as a lifelong career, please don’t miss this golden opportunity.

ITC can nominate up to 5 eligible candidates to compete for the Scholarship by 13 January 2020.  The nominees must attend a selection group interview tentatively to be held in PolyU campus in person during the period 22-23 January or 3-4 February 2020, while the shortlisted PolyU candidates will be required to attend an interview with the Donor in person tentatively in March 2020 in Hong Kong. 

If you wish to be considered as a nominee for the Scholarship by your Department, please

1)      approach Miss Susanna Ng of ITC to indicate your interest on or before 20 December 2019 (Friday).

2)      submit an online application via https://form.jotform.me no later than 30 December 2019 and send the preview of the form (pdf file) or copy of electronic form (embedded in the notification email sent by the Innotech Scholarship Secretariat) to the designated staff of the department concerned. Please click here for the view of the online application form and prepare the required information and Personal Statement before submitting the application online. (It takes more than 15 minutes to complete the form and there is no "save and resume" function for the form. You should submit the application before you leave the computer / electronic device and are requested not to use a public computer / mobile phone to fill in the form.)

Enquiries: This email address is being protected from spambots. You need JavaScript enabled to view it.

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