Introduction:
Nano-imprint system is used to fabricate nanometer scale patterns. It utilizes a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by UV light during the imprinting process. Adhesion between the resist and the template is controlled to allow proper release.
Specifications:
- Substrate size: Up to 4”
- Resolution: Up to sub-10nm
- Auto-Release process: Prevent mold/ substrate damage
- Application: Optical devices, displays, data storage, biomedical devices, semiconductor IC etc.
Notes to user:
Supplier information:
http://ezimprinting.com/index.html
Equipment location:
Room HJ705 (Class 100)
