Two-Photon Laser 3D Nano-Lithography System: Nanoscribe Photonic Professional GT

Major Functions / Key Features

• Metamaterials Preparation Laboratory provides a “Two-photon Laser Nano-lithography System” for custom-making micro- and nano-structures with nanoscale precision
• With the minimum feature sizes of about 100 nm that can be achieved by Nanoscribe Photonic Professional GT, it enables us to realize the pre-designed nanostructures using a “maskless” approach
• This technology is based on the use of specific photoresist solution with the predominant absorption range in UV region
• Getting the advantage of nonlinear two-photon absorption effect, the photoresist in predesigned regions will be polymerized and developed into nanostructure with ultrafine resolution

Computer software programme

• It include to offer user a whole degree of freedom to design and manufacture any structure of three-dimensional trajectories