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Training Session for Denton Sputtering System

Training Session will be held on 31-July at 10:30am. Please go to Denton Sputtering System booking page to enroll. (P.S. Gather at Room HJ709 and need to attend whole training session)

23 Jul, 2019

Training

PVA TePla Plasma Cleaner is Resumed

PVA TePla America IoN Radical Plasma Cleaner is resumed.

20 Jul, 2019

Announcement

Training Session for Inductively Coupled Plasma Etcher (ICP)

Training Session will be held on 17-July at 10:30am. Please go to Inductively Coupled Plasma Etcher booking page to enroll. (P.S. Gather at Room HJ709)

11 Jul, 2019

Training

Training Session for Denton Sputtering System

Training Session will be held on 9-July at 10:30am. Please go to Denton Sputtering System booking page to enroll. (P.S. Gather at Room HJ709 and need to attend whole training session)

9 Jul, 2019

Training

Charge Rates Updated

Charge rates for Sputtering A & B and Thermal evaporator adjusted to HK$40/ hr (internal), HK$60/ hr (UGC-funded institutes) and HK$100/ hr (external), effective on 1-July 2019.

30 Jun, 2019

Announcement

Arrangement for Working Non-Office Hour and Overnight

User who works in non-office hour (office hour: 0900am - 1800pm, Mon-Fri), must have at least one companion. User who needs to stay after 11:00 pm in UMF laboratories, is required to obtain your supervisor approval, by sending the below information and request of stay to your supervisor via Email (one day in advance). After obtaining your supervisor approval, user must forward the information and approval simultaneously to the laboratory persons-in-charge. Your full name Your contact telephone number Laboratory of stay Duration of stay

28 Jun, 2019

Announcement

Training Session for Rapid Thermal Processor AW-410T

Training Session will be held on 3-July at 10:30am. Please go to Rapid Thermal Processor AW-410T booking page to enroll. (P.S. Gather at Room HJ709)

28 Jun, 2019

Training

Cleanroom Lab Access Fee will be Adjusted on 1-July 2019

Lab. Access Fee will be adjusted to HK$50/ calendar day for internal user, effective on 1-July 2019.

21 Jun, 2019

Announcement

Charge Adjustment for Denton Deposition System

The equipment charges for E-beam Deposition System, Sputtering System and Thermal Evaporator will be adjusted to HK$100/ hr (internal), HK$150/ hr (UGC-funded institutes) and HK$500/ hr (external), effective on 1-July 2019.

21 Jun, 2019

Announcement

IMPORTANT: Minimum Charge for Denton Deposition System

- Minimum charge for E-beam and Sputtering System is 2 hrs per booking session. - Minimum charge for Thermal Evaporator is 1.5 hrs per booking session. - All are effective on 1-July 2019.

21 Jun, 2019

Announcement

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