Clean 2D Co. Limited
The global semiconductor market is experiencing significant growth, driven by the increasing demand for advanced electronics in various sectors. However, in conventional electronic devices, contamination from the fabrication process has always been a critical issue since it strongly deteriorates device performance.
Clean 2D Co. Limited has developed the ice-assisted transfer and cleaning method to remove surface contaminants from semiconductor and electronic devices. Ice is the only material used in the cleaning method. This novel cleaning method is cost-saving and environmentally friendly, since there are no other chemicals involved in the process. The electronic devices cleaned by ice are extremely clean and of high quality.
Compared with conventional cleaning methods such as RCA cleaning, which involves exposure to various chemicals and high-temperature annealing, their cleaning method is safer, cheaper, and more environmentally friendly. They believe that their novel cleaning method can help to overcome the traditional problem in the semiconductor industry.
Team Member(s)
LIU Haijun (Department of Applied Physics)
Wang Bodong
Clean 2D Co. Limited has developed the ice-assisted transfer and cleaning method to remove surface contaminants from semiconductor and electronic devices. Ice is the only material used in the cleaning method. This novel cleaning method is cost-saving and environmentally friendly, since there are no other chemicals involved in the process. The electronic devices cleaned by ice are extremely clean and of high quality.
Compared with conventional cleaning methods such as RCA cleaning, which involves exposure to various chemicals and high-temperature annealing, their cleaning method is safer, cheaper, and more environmentally friendly. They believe that their novel cleaning method can help to overcome the traditional problem in the semiconductor industry.
Team Member(s)
LIU Haijun (Department of Applied Physics)
Wang Bodong
